| Research Projects |
Advisor |
Budget |
Duration |
Preliminary Study of Innovative and Cost-effective, Massively Parallel Maskless Lithography
NSC-95-2218-E-002-045 |
Tsai, Kuen-Yu |
504000 |
2006-02-01 ~ 2006-10-01 |
Design, Manufacturing, and Testing (DMT) for Sub-wavelength ULSI Rapid Yield Ramp Phase I: Scoping and Roadmap Planning. Task 2: Manufacturing for Design: Linking Subwavelength Lithography Process and Design Intent for Yield Improvement
95FSB07 |
Tsai, Kuen-Yu |
931500 |
2006-05-01 ~ 2006-10-01 |
Design of MEMS-based Massively Parallel Maskless Electron-beam Lithography Systems
95R0110-03 |
Tsai, Kuen-Yu |
8570000 |
2006-08-01 ~ 2008-07-01 |
Research on Semiconductor Engineering Chain for Sub-wavelength IC Design, Manufacture and Testing. Sub-project III: Integrated Optimization of Design, Manufacturing, and Testing for Improving VLSI Yield and Testing for Improving VLSI Yield and Performance
NSC-95-2221-E-002-436 |
Tsai, Kuen-Yu |
498000 |
2006-08-01 ~ 2007-07-01 |
Development of Electro-magnetic Lens, Blanker and Data Transmission Systems for E-beam Based Massively Parallel Maskless Lithography (MPML2) Systems (I)
NSC-95-2221-E-002-308 |
Tsai, Kuen-Yu |
658000 |
2006-08-01 ~ 2007-07-01 |
VLSI Design for Manufacturability course development project − Module 4: Lithography Process and Variation
95M1146-4 |
Tsai, Kuen-Yu |
400000 |
2006-09-01 ~ 2008-01-01 |
Development of Voiceprint Analytical Systems for Cockpit Voice Recorders
95-3114-E002 -004- |
Tsai, Kuen-Yu |
823000 |
2006-11-01 ~ 2007-10-01 |
Apply Control and Optimization Techniques to lmprove OPC Convergence with Design Intent-Phase II
96E1014 |
Tsai, Kuen-Yu |
700000 |
2007-01-01 ~ 2007-12-01 |
Manufacturing for Design: Linking Sub-wavelength Lithography Process and Design Intent for Manufacturability Improvement – Phase II - Subtask B: Demonstration of Efficient Data Flow for Foundry-Design House Interaction
96FSB10 |
Tsai, Kuen-Yu |
975000 |
2007-01-25 ~ 2007-12-07 |
Manufacturing for Design: Linking Sub-wavelength Lithography Process and Design Intent for Manufacturability Improvement - Phase II - Subtask A: Circuit modeling related to process-induced non-ideal patterning
96FSB09 |
Tsai, Kuen-Yu |
975000 |
2007-01-25 ~ 2007-12-07 |
Analysis of Kinematic Lens Mounting Techniques for Aberration Control to Improve Microlithography Imaging Performances
96E1014 |
Tsai, Kuen-Yu |
320000 |
2007-05-25 ~ 2007-12-21 |
Development of Electro-magnetic Lens, Blanker and Data Transmission Systems for E-beam Based Massively Parallel Maskless Lithography (MPML2) Systems (II)
NSC-96-2221-E-002-274 |
Tsai, Kuen-Yu |
553000 |
2007-08-01 ~ 2008-07-31 |
Modeling Proximity-Effects for E-beam Direct-Write Lithography at 22-nm Half-Pitch Node and beyond
97E3130 |
Tsai, Kuen-Yu |
750000 |
2008-01-01 ~ 2008-12-01 |
Manufacturing for Design: Linking Sub-wavelength Lithography Process and Design Intent for Manufacturability Improvement – Phase III - Subtask B: Lithography-aware Pattern Library and Assist Feature Insertion for CMP/OPC
97-FS-15 |
Tsai, Kuen-Yu |
966000 |
2008-01-01 ~ 2008-11-01 |
Manufacturing for Design: Linking Sub-wavelength Lithography Process and Design Intent for Manufacturability Improvement – Phase III - Subtask A: Lithography-aware Interconnect Parasitics Extraction - RC extraction for single layer
97-FS-14 |
Tsai, Kuen-Yu |
966000 |
2008-01-01 ~ 2008-12-01 |
Scatterometry-Related CD Metrology for 45-nm Half-Pitch Node and Beyond - Phase I - Part (A): Rigorous Simulation of EUV Phase-Shift Masks for 32-nm Half-Pitch Node and Beyond
97-S-C35 |
Tsai, Kuen-Yu |
1148175 |
2008-04-01 ~ 2009-03-01 |
Scatterometry-Related CD Metrology for 45-nm Half-Pitch Node and Beyond - Phase I - Part (B): Rigorous Simulation of CD-Calibration Samples
97-S-C36 |
Tsai, Kuen-Yu |
1148175 |
2008-04-01 ~ 2009-03-01 |
Scatterometry-Related CD Metrology for 45-nm Half-Pitch Node and Beyond - Phase I - Part (C): Fabrication and Metrology of CD-Calibration Samples
97-S-C37 |
Tsai, Kuen-Yu |
1102102 |
2008-04-01 ~ 2009-03-01 |
Investigations on extreme ultraviolet lithography (EUVL) from beamline construction, masks, materials, processes, to reliability of nano devices (1/3)
97-2120-M-009-007 |
Tsai, Kuen-Yu |
6800000 |
2008-08-01 ~ 2009-07-01 |
Research and Development of MEMS-based Massively Parallel Maskless Electron-beam Direct-Write Lithography Systems and Processes
97-2622-E-002-012-CC1 |
Tsai, Kuen-Yu |
28612000 |
2008-08-01 ~ 2009-10-01 |
Development of Electro-magnetic Lens, Blanker and Data Transmission Systems for E-beam Based Massively Parallel Maskless Lithography (MPML2) Systems (III)
NSC-97-2221-E-002-209 |
Tsai, Kuen-Yu |
798000 |
2008-08-01 ~ 2009-07-01 |
Exploratory Research on Multiple Exposure Aware Optical Proximity Correction Algorithms for Extension of Lithography to Sub-32nm Half-pitch Node
97R0330 |
Tsai, Kuen-Yu |
1000000 |
2008-08-01 ~ 2009-07-01 |
Research and Development of Speckle Reduction for Pico-Projector Modules
98-S-C10 |
Tsai, Kuen-Yu |
497700 |
2009-03-01 ~ 2010-03-01 |
Non-ProtoBar Optical Proximity Correction
98-S-C37 |
Tsai, Kuen-Yu |
776160 |
2009-05-01 ~ 2010-04-01 |
Investigations on extreme ultraviolet lithography (EUVL) from beamline construction, masks, materials, processes, to reliability of nano devices (2/3)
98-2120-M-009-007 |
Tsai, Kuen-Yu |
6800000 |
2009-08-01 ~ 2010-07-01 |
Research and Development of MEMS-based Massively Parallel Maskless Electron-beam Direct-Write Lithography Systems and Processes
98-2622-E-002-003-CC1 |
Tsai, Kuen-Yu |
26848000 |
2009-08-01 ~ 2010-07-01 |
Automatic Multiple-Exposure-Aware Photomask Design for Extending Optical Lithography to 32-nm Half-Pitch Node and Beyond
98-2221-E-002-118-MY3 |
Tsai, Kuen-Yu |
2659000 |
2009-08-01 ~ 2012-07-01 |
Research and Development of a Zone-plate-array Based EUV Direct-Write Lithography System
NSC-98-2221-E-002-164-MY3 |
Tsai, Kuen-Yu |
7435000 |
2009-08-01 ~ 2012-07-01 |
Research and Development of High-Performance Computing and Digital Signal Processing Technologies for Automatic Optical Inspection Systems
98R0101 |
Tsai, Kuen-Yu |
1312500 |
2009-08-01 ~ 2010-07-01 |
Exposure and Resist Models for Electron-Beam-Direct-Write
98-S-C54 |
Tsai, Kuen-Yu |
804975 |
2009-10-15 ~ 2010-10-14 |
Scatterometry-Related CD Metrology for 45-nm Half-Pitch Node and Beyond - Phase II - Part (B): Fabrication and Metrology of CD-Calibration Samples
99-S-C08 |
Tsai, Kuen-Yu |
1852767 |
2010-01-01 ~ 2010-12-01 |
Scatterometry-Related CD Metrology for 45-nm Half-Pitch Node and Beyond - Phase II - Part (A): Rigorous Simulation of CD-Calibration Samples
99-S-C07 |
Tsai, Kuen-Yu |
1028160 |
2010-01-01 ~ 2010-12-01 |
Investigations on extreme ultraviolet lithography (EUVL) from beamline construction, masks, materials, processes, to reliability of nano devices (3/3)
99-2120-M-009-004 |
Tsai, Kuen-Yu |
4800000 |
2010-08-01 ~ 2011-07-01 |
Design for Yield and Reliability for Sub-22nm Technologies
99-2221-E-002-216-MY3 |
Tsai, Kuen-Yu |
2178000 |
2010-08-01 ~ 2013-07-01 |
Research and Development of Automatic Integrated-Circuit Layout Optimization Techniques Considering Shape-to-Electrical Effects due to Sub-wavelength Lithography for SOC IP Reuse
99R70408 |
Tsai, Kuen-Yu |
982000 |
2010-08-01 ~ 2011-07-01 |
Study of Etch Modeling for Accurate Optical Proximity Correction
98-S-C51 |
Tsai, Kuen-Yu |
804975 |
2010-09-15 ~ 2011-10-14 |
Modeling, Simulation, and Applications of Directed Self-Assembly for 16-nm Half-Pitch Node Lithography and Beyond
100T911F492 |
Tsai, Kuen-Yu |
1265000 |
2011-07-01 ~ 2012-06-30 |
Investigations on extreme ultraviolet lithography II (EUVL II)- from light source, metrology, to reliability of nano devices (1/3)
100-2120-M-009-010 |
Tsai, Kuen-Yu |
10000000 |
2011-08-01 ~ 2012-07-31 |
Research and Development of Speckle Reduction for Pico-Projector Modules Phase II Design and Fabrication of Diffractive Optical Elements for Speckle Reduction
100-S-C77 |
Tsai, Kuen-Yu |
1049801 |
2011-12-01 ~ 2013-08-31 |
Modeling, Simulation, and Applications of Directed Self-Assembly for 16-nm Half-Pitch Node Lithography and Beyond (II)
101E31051 |
Tsai, Kuen-Yu |
1265000 |
2012-07-01 ~ 2013-06-30 |
Scatterometry-Related CD Metrology for 45-nm Half-Pitch Node and Beyond - Phase III - Part (A) Direct-Scatterometry-Enabled Lithography Model Calibration
|
Tsai, Kuen-Yu |
1249038 |
2012-08-01 ~ 2013-07-31 |
Nanolithography Patterning Enhancement and Nonrectangular-Geometry Modeling Techniques for Multiple-Gate CMOS Devices at the 11 nm Half-Pitch Node and Beyond (I)
NSC-101-2221-E-002-206 |
Tsai, Kuen-Yu |
842000 |
2012-08-01 ~ 2013-07-31 |
Fabrication of compound eye micro-lens array and its application (1/3)
101-2221-E-002-099 |
Tsai, Kuen-Yu |
3291000 |
2012-08-01 ~ 2013-07-31 |
Research and development of information extraction from light field scanned data
101-2221-E-006-143 |
Tsai, Kuen-Yu |
621000 |
2012-08-01 ~ 2013-07-31 |
Investigations on extreme ultraviolet lithography II (EUVL II)- from light source, metrology, to reliability of nano devices (2/3)
101-2120-M-009-007 |
Tsai, Kuen-Yu |
10000000 |
2012-08-01 ~ 2013-07-31 |
Resistance, Capacitance, and Inductance Modeling Technologies and Tools for Interposer-Based 3D ICs (2/3)
102-2220-E-002-030 |
Tsai, Kuen-Yu |
908000 |
2013-05-01 ~ 2014-04-30 |
Investigations on extreme ultraviolet lithography II (EUVL II)- from light source, metrology, to reliability of nano devices (3/3)
102-2120-M-009-005 |
Tsai, Kuen-Yu |
13136368 |
2013-08-01 ~ 2014-07-31 |
Pathfinding for 7–5nm Semiconductor Technology Nodes (1/5)
102-2622-E-002-014 |
Tsai, Kuen-Yu |
99995000 |
2013-08-01 ~ 2014-07-31 |
Fabrication of compound eye micro-lens array and its application (2/3)
102-2221-E-002-005 |
Tsai, Kuen-Yu |
2985312 |
2013-08-01 ~ 2014-07-31 |
Resistance, Capacitance, and Inductance Modeling Technologies and Tools for Interposer-Based 3D ICs (3/3)
MOST103-2220-E-002-016 |
Tsai, Kuen-Yu |
986000 |
2014-05-01 ~ 2015-04-30 |
Address：No.1, Sec. 4, Roosevelt Road, Taipei, Taiwan 106